New Delhi, September 17(APAC Media): Japanese company Fujifilm will invest around ₹800 crore ($83 million) to build a semiconductor materials manufacturing facility in India, as the country expands its semiconductor manufacturing ecosystem.
The investment will be made in two phases, starting October 2026, with commercial production at the new facility expected to begin in fiscal year 2028, Fujifilm said on September 16.
The first phase will focus on materials used in front-end semiconductor manufacturing processes. The second phase will include semiconductor surface conditioning materials and high-purity chemicals.
Fujifilm said the timing and scale of the second phase will depend on the pace of growth in India’s semiconductor industry and customer demand.
The company plans to align the project with the India Semiconductor Mission and leverage support under the government’s India Semiconductor Mission 2.0 policy, which was approved in July 2026.
The investment comes as India seeks to build domestic semiconductor manufacturing and reduce dependence on imported components and materials. Semiconductor materials are used across multiple stages of chip manufacturing, including wafer processing and surface treatment.
Fujifilm’s planned facility will add to the growing number of investments targeting India’s semiconductor supply chain as the government seeks to develop a broader chip manufacturing ecosystem in the country.
Also Read: SEMICON India 2026 Explained: How India Is Building Its Semiconductor Ecosystem
